The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2020
Filed:
Jun. 16, 2017
Applicant:
Nxp Usa, Inc., Austin, TX (US);
Inventor:
Rama I. Hegde, Austin, TX (US);
Assignee:
NXP USA, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/28 (2006.01); H01L 29/66 (2006.01); H01L 21/285 (2006.01); H01L 21/02 (2006.01); H01L 29/49 (2006.01); H01L 29/51 (2006.01); B81C 1/00 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28255 (2013.01); B81C 1/00238 (2013.01); H01L 21/02181 (2013.01); H01L 21/02244 (2013.01); H01L 21/02255 (2013.01); H01L 21/28229 (2013.01); H01L 21/28562 (2013.01); H01L 29/495 (2013.01); H01L 29/517 (2013.01); H01L 29/6656 (2013.01); B81C 2203/035 (2013.01); H01L 21/76898 (2013.01);
Abstract
A method of removing an oxide layer is provided. A metal layer is deposited over an oxide layer formed at a top surface of a germanium substrate. A metal oxide layer is deposited over the metal layer. The metal oxide layer includes a same metal material as the metal layer. The metal layer and the oxide layer are reacted and combined with the metal oxide layer to form a dielectric layer during an anneal process. During the anneal process, the oxide layer is reacted with the metal layer and removed.