The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2020

Filed:

Oct. 10, 2019
Applicant:

Transphorm Technology, Inc., Goleta, CA (US);

Inventors:

Umesh Mishra, Montecito, CA (US);

Davide Bisi, Goleta, CA (US);

Geetak Gupta, Goleta, CA (US);

Carl Joseph Neufeld, Goleta, CA (US);

Brian L. Swenson, Santa Barbara, CA (US);

Rakesh K. Lal, Isla Vista, CA (US);

Assignee:

Transphorm Technology, Inc., Goleta, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0256 (2006.01); H01L 29/778 (2006.01); H01L 29/205 (2006.01); H01L 29/06 (2006.01); H01L 29/66 (2006.01); H01L 29/10 (2006.01); H01L 29/20 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7788 (2013.01); H01L 29/0692 (2013.01); H01L 29/1037 (2013.01); H01L 29/205 (2013.01); H01L 29/66462 (2013.01); H01L 29/7783 (2013.01); H01L 29/2003 (2013.01);
Abstract

A lateral III-N device has a vertical gate module with III-N material orientated in an N-polar or a group-III polar orientation. A III-N material structure has a III-N buffer layer, a III-N barrier layer, and a III-N channel layer. A compositional difference between the III-N barrier layer and the III-N channel layer causes a 2DEG channel to be induced in the III-N channel layer. A p-type III-N body layer is disposed over the III-N channel layer in a source side access region but not over a drain side access region. A n-type III-N capping layer over the p-type III-N body layer. A source electrode that contacts the n-type III-N capping layer is electrically connected to the p-type III-N body layer and is electrically isolated from the 2DEG channel when the gate electrode is biased relative to the source electrode at a voltage that is below a threshold voltage.


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