The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2020
Filed:
May. 30, 2019
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Timothee Julien Vincent Blanquart, Tama, JP;
Mitsuya Utsuno, Tama, JP;
Yoshio Susa, Tama, JP;
Atsuki Fukazawa, Tama, JP;
Toshio Nakanishi, Tama, JP;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/455 (2006.01); H01L 21/762 (2006.01); H01L 21/768 (2006.01); C23C 16/26 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0228 (2013.01); C23C 16/26 (2013.01); C23C 16/45542 (2013.01); C23C 16/50 (2013.01); H01L 21/02115 (2013.01); H01L 21/02205 (2013.01); H01L 21/02274 (2013.01); H01L 21/76224 (2013.01); H01L 21/76229 (2013.01); H01L 21/76837 (2013.01);
Abstract
A film having filling capability is deposited by forming a viscous polymer in a gas phase by striking an Ar, He, or Nplasma in a chamber filled with a volatile hydrocarbon precursor that can be polymerized within certain parameter ranges which define mainly partial pressure of precursor during a plasma strike, and wafer temperature.