The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2020
Filed:
Feb. 24, 2017
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Inventors:
Ke-Chih Liu, Hsinchu, TW;
Chia-Ming Tsai, Zhubei, TW;
Yen-Yu Chen, Taichung, TW;
Yueh-Ching Pai, Taichung, TW;
Yu-Min Chang, Hsinchu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/52 (2006.01); H01L 21/02 (2006.01); C23C 16/448 (2006.01); H01L 21/67 (2006.01); C23C 16/46 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
C23C 16/52 (2013.01); C23C 16/4481 (2013.01); C23C 16/4482 (2013.01); C23C 16/46 (2013.01); H01L 21/02104 (2013.01); H01L 21/67248 (2013.01); H01L 22/12 (2013.01);
Abstract
A method includes applying a first amount of heat to a vapor region of a precursor canister, measuring an indication of saturated vapor pressure within the vapor region during the applying the first amount of heat, and applying a second amount of heat to the vapor region of the precursor canister, the second amount of heat being adjusted from the first amount of heat based on the indication of saturated vapor pressure.