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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10748788 B1

PDFFull Text
Expired
Date of Patent:
Aug. 18, 2020

Filed:

Mar. 15, 2018

System and method for monitoring treatment of microelectronic substrates with fluid sprays such as cryogenic fluid sprays

Applicant:

Tel Fsi, Inc., Chaska, MN (US);

Inventors:

Brent D. Schwab, Burnsville, MN (US);

Chimaobi W. Mbanaso, Chaska, MN (US);

Gregory P. Thomes, Chaska, MN (US);

Kevin Rolf, Victoria, MN (US);

Jeffrey M. Lauerhaas, Waconia, MN (US);

Assignee:

TEL FSI, INC., Chaska, MN (US);

Attorney:

Kagan Binder, PLLC

Primary Examiner:

Mikhail Kornakov

Assistant Examiner:

Natasha N Campbell

Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/687 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); H01L 21/02041 (2013.01); H01L 21/02076 (2013.01); H01L 21/67109 (2013.01); H01L 21/67253 (2013.01); H01L 21/68714 (2013.01); H01L 21/68764 (2013.01);
Abstract

A system and method for treating a substrate is described. In particular, the system and method for treating a substrate include techniques for removing particles from the surface of a microelectronic substrate. The system includes: a vacuum process chamber; a substrate stage for supporting a microelectronic substrate within the vacuum process chamber; a cryogenic fluid supply system that can provide a fluid or fluid mixture through one or more nozzles arranged within the vacuum process chamber to inject a fluid spray into the process chamber in a direction towards an upper surface of the microelectronic substrate; and a process monitoring system coupled to the vacuum process chamber, and arranged to collect fluid spray data corresponding to at least one measured attribute of the injected fluid spray downstream of an exit of the one or more nozzles.

Find Patent Forward Citations

Schwab, Brent. (2020). System and method for monitoring treatment of microelectronic substrates with fluid sprays such as cryogenic fluid sprays (U.S. Patent No. 10748788). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10748788

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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