The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2020
Filed:
Jun. 27, 2019
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Bob Streefkerk, Tilburg, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Christiaan Alexander Hoogendam, Westerhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Knegsel, NL;
Johannes Catharinus Hubertus Mulkens, Valkenswaard, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70341 (2013.01); G03F 7/70866 (2013.01); G03F 9/7026 (2013.01); G03F 9/7034 (2013.01);
Abstract
In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.