The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2020

Filed:

Aug. 03, 2018
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Thomas Aichinger, Villach, AT;

Romain Esteve, Villach, AT;

Dethard Peters, Hoechstadt, DE;

Roland Rupp, Lauf, DE;

Ralf Siemieniec, Villach, AT;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/08 (2006.01); H01L 29/66 (2006.01); H01L 29/739 (2006.01); H01L 27/06 (2006.01); H01L 29/06 (2006.01); H01L 29/40 (2006.01); H01L 29/417 (2006.01); H01L 29/36 (2006.01); H01L 29/861 (2006.01); H01L 29/872 (2006.01); H01L 29/04 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7804 (2013.01); H01L 27/0629 (2013.01); H01L 29/0619 (2013.01); H01L 29/0878 (2013.01); H01L 29/401 (2013.01); H01L 29/417 (2013.01); H01L 29/66348 (2013.01); H01L 29/66719 (2013.01); H01L 29/66734 (2013.01); H01L 29/7397 (2013.01); H01L 29/7805 (2013.01); H01L 29/7806 (2013.01); H01L 29/7813 (2013.01); H01L 29/045 (2013.01); H01L 29/0626 (2013.01); H01L 29/0696 (2013.01); H01L 29/36 (2013.01); H01L 29/41766 (2013.01); H01L 29/6634 (2013.01); H01L 29/66068 (2013.01); H01L 29/861 (2013.01); H01L 29/872 (2013.01);
Abstract

A semiconductor device includes trench structures that extend from a first surface into a semiconductor body. The trench structures include a gate structure and a contact structure that extends through the gate structure, respectively. Transistor mesas are between the trench structures. Each transistor mesa includes a body zone forming a first pn junction with a drift structure and a second pn junction with a source zone. Diode regions directly adjoin one of the contact structures form a third pn junction with the drift structure, respectively.


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