The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2020

Filed:

Nov. 16, 2015
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Prashant Majhi, San Jose, CA (US);

Jack T. Kavalieros, Portland, OR (US);

Elijah V. Karpov, Santa Clara, CA (US);

Uday Shah, Portland, OR (US);

Ravi Pillarisetty, Portland, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 29/739 (2006.01); H01L 29/267 (2006.01);
U.S. Cl.
CPC ...
H01L 29/78 (2013.01); H01L 29/267 (2013.01); H01L 29/66356 (2013.01); H01L 29/66969 (2013.01); H01L 29/7391 (2013.01);
Abstract

Heterojunction tunnel field effect transistors (hTFETs) incorporating one or more oxide semiconductor and a band offset between at least one of a channel material, a source material of a first conductivity type, and drain of a second conductivity type, complementary to the first. In some embodiments, at least one of p-type material, channel material and n-type material comprises an oxide semiconductor. In some embodiments, two or more of p-type material, channel material, and n-type material comprises an oxide semiconductor. In some n-type hTFET embodiments, all of p-type, channel, and n-type materials are oxide semiconductors with a type-II or type-III band offset between the p-type and channel material.


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