The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2020

Filed:

Dec. 10, 2013
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Koji Takayanagi, Koshi, JP;

Yukie Minekawa, Koshi, JP;

Yuichi Yoshida, Koshi, JP;

Kousuke Yoshihara, Koshi, JP;

Yuichi Terashita, Koshi, JP;

Toshinobu Furusho, Koshi, JP;

Takashi Sasa, Koshi, JP;

Assignee:

Tokyo Electron Limited, Minato-Ku, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); F04B 49/06 (2006.01); F04B 43/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67017 (2013.01); F04B 43/0081 (2013.01); F04B 49/065 (2013.01); H01L 21/6715 (2013.01); F04B 2205/503 (2013.01);
Abstract

A filtration efficiency, which is similar to the filtration efficiency obtained when a plurality of filters are provided, can be obtained by one filter, and decrease in throughput can be prevented. Based on a control signal from a control unit, a resist liquid L is sucked into a pumpthrough a filter. A part of the resist liquid sucked in the pump is discharged from a discharge nozzle. The remaining resist liquid is returned to a supply conduiton a primary side of the filter. A process is synthesized by adding a replenishment amount equal to the discharge amount to the return amount. The discharge of the synthesized process liquid and the filtration thereof by the filter are performed the number of times corresponding to a rate between the discharge amount and the return amount.


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