The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2020

Filed:

Aug. 22, 2017
Applicant:

Asml Holding N.v., Veldhoven, NL;

Inventors:

Yevgeniy Konstantinovich Shmarev, Lagrangeville, NY (US);

Stanislav Smirnov, Danbury, CT (US);

Assignee:

ASML Holding N.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/88 (2006.01); G01N 21/21 (2006.01); G01N 21/95 (2006.01); G03F 7/207 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G01N 21/8806 (2013.01); G01N 21/21 (2013.01); G01N 21/9501 (2013.01); G03F 7/70641 (2013.01); G01N 2021/8822 (2013.01); G01N 2021/8835 (2013.01); G01N 2021/8848 (2013.01); G01N 2201/0636 (2013.01); G01N 2201/0683 (2013.01);
Abstract

An inspection apparatus includes an inspection optical system configured to a direct an inspection beam onto a surface of a substrate, the inspection optical system having an objective, a focus measurement optical system configured to receive a focus measurement beam, redirected by the substrate, from the objective, the focus measurement optical system having a movable reflective element configured to receive the focus measurement beam, and a control system configured to cause movement of the reflective element with a direction component along a beam path of the focus measurement beam and configured to determine whether the substrate surface is in the focus of the objective based on the focus measurement beam.


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