The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2020
Filed:
Jan. 03, 2019
Applied Materials, Inc., Santa Clara, CA (US);
Yang Yang, Los Gatos, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Steven Lane, Portersville, CA (US);
Gonzalo Monroy, San Francisco, CA (US);
Lucy Zhiping Chen, Santa Clara, CA (US);
Yue Guo, Redwood City, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments described herein relate to apparatus and methods for performing electron beam reactive plasma etching (EBRPE). In one embodiment, an apparatus for performing EBRPE processes includes an electrode formed from a material having a high secondary electron emission coefficient. In another embodiment, methods for etching a substrate include generating a plasma and bombarding an electrode with ions from the plasma to cause the electrode to emit electrons. The electrons are accelerated toward a substrate to induce etching of the substrate.