The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2020

Filed:

Oct. 24, 2018
Applicant:

National Chung-shan Institute of Science and Technology, Taoyuan, TW;

Inventors:

Po-Shen Lin, Taoyuan, TW;

Chih-Peng Chen, Taoyuan, TW;

Kuo-Kuang Jen, Taoyuan, TW;

Yu-Ching Tseng, Keelung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F16L 43/00 (2006.01); F16L 9/00 (2006.01); F17D 1/20 (2006.01); F17D 1/08 (2006.01); F15D 1/06 (2006.01); F15D 1/04 (2006.01); F15D 1/00 (2006.01); B33Y 80/00 (2015.01);
U.S. Cl.
CPC ...
F16L 43/00 (2013.01); F15D 1/0085 (2013.01); F15D 1/04 (2013.01); F15D 1/06 (2013.01); F16L 9/006 (2013.01); F17D 1/08 (2013.01); F17D 1/20 (2013.01); B33Y 80/00 (2014.12);
Abstract

The curved flow channel with built-in lattice structure provided by the present application is configured with the lattice structure disposed at the outer inside wall of the curved section away from a center of curvature of the curved section. Through geometry and distribution design of the lattice structure, flow rate and flow direction of fluid impacting the lattice structure can be altered, which achieves the purpose of flow rate redistribution in the curved flow channel and produces a downstream flow field with uniform distribution.


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