The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2020
Filed:
Jul. 25, 2019
Fei Company, Hillsboro, OR (US);
Nikolaos Kontaras, Eindhoven, NL;
Bart Jozef Janssen, Eindhoven, NL;
Cornelis Sander Kooijman, Veldhoven, NL;
Duarte Guerreiro Tome Antunes, Eindhoven, NL;
FEI Company, Hillsboro, OR (US);
Abstract
The invention relates to a method for analyzing an analogue signal comprising randomly spaced events having an event height. The method includes irradiating a sample with a focused beam of energetic electrons, detecting emission from the sample in response to such irradiation, and converting an analog signal of the emissions to a stationary time signal. The method further includes determining an estimated noise contribution for the stationary time signal, and determining an estimated event height of an event based on the stationary time signal and the estimated noise contribution for the stationary time signal, and determining, based on the estimated event height, an energy of the emission detected by the detector. This method is particularly useful for X-ray detectors, such as Silicon Drift Detectors, used in a SEM. By estimating the noise contribution to the signal, the step height is estimated with improved accuracy.