The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2020

Filed:

Jun. 01, 2017
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Ning Gu, San Jose, CA (US);

Daimian Wang, Fremont, CA (US);

Jen-Shiang Wang, Sunnyvale, CA (US);

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G06F 30/30 (2020.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70616 (2013.01); G03F 7/705 (2013.01); G03F 7/70633 (2013.01); G06F 30/30 (2020.01);
Abstract

A method including computing a multi-variable cost function, the multi-variable cost function representing a metric characterizing a degree of matching between a result when measuring a metrology target structure using a substrate measurement recipe and a behavior of a pattern of a functional device, the metric being a function of a plurality of design variables including a parameter of the metrology target structure, and adjusting the design variables and computing the cost function with the adjusted design variables, until a certain termination condition is satisfied.


Find Patent Forward Citations

Gu, Ning. (2020). Substrate measurement recipe configuration to improve device matching (U.S. Patent No. 10691029). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10691029

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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