The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2020
Filed:
Jun. 28, 2017
Tokyo Electron Limited, Tokyo, JP;
Akira Murata, Koshi, JP;
Satoshi Kaneko, Koshi, JP;
Kazuki Motomatsu, Koshi, JP;
Kazunori Sakamoto, Koshi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate processing apparatus can suppress particle generation on a substrate, and can reduce a consumption amount of a processing liquid. A substrate processing apparatusincludes a processing chamberhaving a processing spacein which a substrate W is processed; a vaporizing tank, configured to store the processing liquid therein, having a vaporization spacein which the stored processing liquid is allowed to be vaporized; a decompression driving unitconfigured to decompress the vaporization space; and a control unit. The control unitvaporizes the processing liquid into the processing gas by decompressing the vaporization spacewithout through the processing space, and then, vaporizes the processing liquid into the processing gas by decompressing the vaporization spacethrough the processing space, and supplies an inert gas into the vaporization space