The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2020
Filed:
Jan. 16, 2018
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Wouter Bernardus Johannes Hakvoort, Enschede, NL;
Richard Petrus Hogervorst, Enschede, NL;
Petrus Theodorus Rutgers, Hengelo, NL;
Kerstin Hild, Schwaebisch Gmuend, DE;
Toralf Gruner, Aalen, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
Mirror elements () include a substrate () and a multilayer arrangement (). The multilayer arrangement includes a reflective layer system () having a radiation entrance surface () and a piezoelectric layer () arranged between the radiation entrance surface and the substrate. Each mirror element includes an electrode arrangement () associated with the piezoelectric layer. A layer thickness (tp) of the piezoelectric layer is controlled by the electric field generated. An interconnection arrangement () electrically interconnects adjacent electrodes of adjacent electrode arrangements. According to one formulation, the interconnection arrangement generates an electric field in a gap region () between the adjacent electrodes. According to another, an electric resistance (Ri) of the interconnection arrangement in the gap region is greater than an electric resistance (Rw) of the adjacent electrodes and less than an electric resistance (Rl) of the piezoelectric layers of adjacent electrode arrangements.