The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2020
Filed:
Jan. 05, 2017
Applicant:
Bruker Jv Israel Ltd., Migdal HaEmek, IL;
Inventors:
Assignee:
BRUKER TECHNOLOGIES LTD., Migdal, HaEmek, IL;
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); G01N 23/201 (2018.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01N 23/201 (2013.01); G01B 2210/56 (2013.01); G01N 2223/051 (2013.01); G01N 2223/6116 (2013.01); H01L 22/12 (2013.01);
Abstract
A method for X-ray scatterometry includes receiving a first distribution of an X-ray beam scattered from a sample. The first distribution exhibits asymmetry with respect to a reference axis. A correction is applied to the first distribution, so as to produce a second distribution in which a level of the asymmetry is reduced relative to the first distribution. One or more parameters of the sample are estimated based on the second distribution.