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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10678137 B1

PDFFull Text
Date of Patent:
Jun. 09, 2020

Filed:

Sep. 22, 2014

Multi-pass patterning using nonreflecting radiation lithography on an underlying grating

Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Manish Chandhok, Beaverton, OR (US);

Todd R. Younkin, Cary, NC (US);

Sang H. Lee, Saratogoa, CA (US);

Charles H. Wallace, Portland, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:

Green, Howard & Mughal LLP

Primary Examiner:

Daborah Chacko-Davis

Int. Cl.
CPC ...
H01L 21/768 (2006.01); G03F 7/20 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01); H01L 21/027 (2006.01); G03F 7/00 (2006.01); G03F 7/09 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70 (2013.01); G03F 7/0035 (2013.01); G03F 7/094 (2013.01); G03F 7/2039 (2013.01); G03F 7/70466 (2013.01); H01L 21/0273 (2013.01); H01L 21/0274 (2013.01); H01L 21/0277 (2013.01); H01L 21/0332 (2013.01); H01L 21/31144 (2013.01); H01L 21/76816 (2013.01);
Abstract

Techniques related to multi-pass patterning lithography, device structures, and devices formed using such techniques are discussed. Such techniques include exposing a resist layer disposed over a grating pattern with non-reflecting radiation to generate an enhanced exposure portion within a trench of the grating pattern and developing the resist layer to form a pattern layer having a pattern structure within the trench of the grating pattern.

Find Patent Forward Citations

Chandhok, Manish. (2020). Multi-pass patterning using nonreflecting radiation lithography on an underlying grating (U.S. Patent No. 10678137). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10678137

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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