The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2020

Filed:

Jan. 19, 2018
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Jih-Jse Lin, New Taipei, TW;

Ryan Chia-Jen Chen, Chiayi, TW;

Fang-Cheng Chen, Hsinchu, TW;

Ming-Ching Chang, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/762 (2006.01); H01L 21/8234 (2006.01); H01L 21/764 (2006.01); H01L 27/088 (2006.01); H01L 21/3065 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 21/311 (2006.01); H01L 29/165 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76232 (2013.01); H01L 21/3065 (2013.01); H01L 21/764 (2013.01); H01L 21/823431 (2013.01); H01L 21/823481 (2013.01); H01L 27/0886 (2013.01); H01L 29/66545 (2013.01); H01L 21/31144 (2013.01); H01L 21/823437 (2013.01); H01L 29/165 (2013.01); H01L 29/665 (2013.01); H01L 29/7848 (2013.01);
Abstract

FinFET devices and methods of forming the same are disclosed. One of the FinFET devices includes first fins, second fins, a first gate strip, a second gate strip and a comb-like insulating structure. The first and second fins are disposed on a substrate. The first gate strip is disposed across the first fins. The second gate strip is disposed across the second fins. The comb-like insulating structure is disposed between the first gate strip and the second gate strip and has a plurality of comb tooth parts. In some embodiments, each of the comb tooth parts has a middle-wide profile.


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