The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2020
Filed:
Jun. 18, 2019
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Jochen Knopf, Aalen, DE;
Mohammad Awad, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
The disclosure provides a method and an apparatus for modifying imaging properties of a microlithographic optical system. In a method according to the disclosure, the imaging properties are modified by way of control signals coupled into the optical system by way of at least one interface. The values of the control signals that are in each case coupled in during the controlling for a desired modification of the imaging properties are ascertained on the basis of a model. The model is created by virtue of performing, in a learning phase in which the modification of the imaging properties that is in each case attained for different values of the control signals is ascertained, a successive individual adaptation of the model to the optical system. The learning phase is performed without prior specification of explicit information relating to internal mechanisms of action within the optical system.