The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2020
Filed:
May. 12, 2015
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Leonid Poslavsky, Belmont, CA (US);
Liequan Lee, Fremont, CA (US);
Assignee:
KLA-TENCOR CORPORATION, Milpitas, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01); G01B 11/00 (2006.01); G01N 21/956 (2006.01); G01N 21/21 (2006.01); G03F 7/20 (2006.01); G01B 21/04 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01B 11/02 (2013.01); G01B 11/00 (2013.01); G01B 21/04 (2013.01); G01N 21/211 (2013.01); G01N 21/9501 (2013.01); G01N 21/95607 (2013.01); G03F 7/70625 (2013.01); G01N 2021/213 (2013.01); G01N 2021/95615 (2013.01);
Abstract
A library expansion system, method, and computer program product for metrology are provided. In use, processing within a first multi-dimensional library is performed by a metrology system. During the processing within the first multi-dimensional library, a second multi-dimensional library is identified. The processing is then transitioned to the second multi-dimensional library. Further, processing within the second multi-dimensional library is performed by the metrology system.