The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2020

Filed:

Sep. 12, 2018
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Jeffrey W. Anthis, San Jose, CA (US);

Chang Ke, Sunnyvale, CA (US);

Pratham Jain, Santa Clara, CA (US);

Benjamin Schmiege, Santa Clara, CA (US);

Guoqiang Jian, San Jose, CA (US);

Michael S. Jackson, Sunnyvale, CA (US);

Lei Zhou, San Jose, CA (US);

Paul F. Ma, Santa Clara, CA (US);

Liqi Wu, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/311 (2006.01); H01L 21/033 (2006.01); H01L 21/3105 (2006.01); H01L 21/67 (2006.01); H01L 21/32 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02334 (2013.01); H01L 21/02172 (2013.01); H01L 21/02271 (2013.01); H01L 21/0337 (2013.01); H01L 21/3105 (2013.01); H01L 21/31116 (2013.01); H01L 21/32 (2013.01); H01L 21/67288 (2013.01);
Abstract

Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface are described. The methods include exposing a substrate to a blocking molecule to selectively deposit a blocking layer on the first surface. A layer is selectively formed on the second surface and defects of the layer are formed on the blocking layer. The defects are removed from the blocking layer on the first surface.


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