The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2020

Filed:

Mar. 06, 2018
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Vitaliy Shklover, Konigsbronn, DE;

Michael Schall, Essingen, DE;

Johannes Kraus, Theilheim, DE;

Oliver Gloeckl, Aalen, DE;

Jeffrey Erxmeyer, Oberkochen, DE;

Horst Feldermann, Aalen, DE;

Konstantin Forcht, Aalen, DE;

Ute Heinemeyer, Neustadt an der Weinstrasse, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, unknown;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 7/20 (2006.01); G02B 1/115 (2015.01);
U.S. Cl.
CPC ...
G03F 7/70958 (2013.01); G02B 1/115 (2013.01); G03F 7/7015 (2013.01); G03F 7/70191 (2013.01); G03F 7/70316 (2013.01);
Abstract

In order to make possible both good laser resistance and good antireflection properties, an optical element, in particular for UV lithography, comprising a substrate and a coating on the substrate having at least four layers, is proposed, wherein


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