The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2020

Filed:

Dec. 12, 2017
Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Masayuki Nakanishi, Tokyo, JP;

Kenji Kodera, Tokyo, JP;

Yasuyuki Miyasawa, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 9/06 (2006.01); B24B 21/00 (2006.01); B24B 21/08 (2006.01); H01L 21/02 (2006.01); B24B 37/07 (2012.01); B24B 31/12 (2006.01);
U.S. Cl.
CPC ...
B24B 9/065 (2013.01); B24B 21/002 (2013.01); B24B 21/08 (2013.01); B24B 37/07 (2013.01); H01L 21/02021 (2013.01); B24B 31/12 (2013.01);
Abstract

A polishing apparatus which can keep a width of a polishing tool constant when a peripheral portion of a substrate is polished by the polishing tool is disclosed. The polishing apparatus includes a substrate holderconfigured to hold a substrate W and to rotate the substrate W, and a pressing padconfigured to press a polishing toolagainst a peripheral portion of the substrate W held by the substrate holder. The pressing padincludes an elastic memberhaving a pressing surfaceconfigured to press the polishing toolagainst the peripheral portion of the substrate W and a support memberconfigured to support the elastic member. The support memberhas a recessformed in a front surfaceof the support member, the elastic memberbeing capable of entering the recess


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