The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2020
Filed:
Apr. 09, 2019
Applicant:
Texas Instruments Incorporated, Dallas, TX (US);
Inventors:
Assignee:
TEXAS INSTRUMENTS INCORPORATED, Dallas, TX (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 49/02 (2006.01); H01L 21/283 (2006.01); H01L 21/311 (2006.01); H01L 21/768 (2006.01); H01L 23/535 (2006.01);
U.S. Cl.
CPC ...
H01L 28/60 (2013.01); H01L 21/283 (2013.01); H01L 21/31111 (2013.01); H01L 21/76895 (2013.01); H01L 23/535 (2013.01);
Abstract
An integrated trench capacitor and method for making the trench capacitor is disclosed. The method includes forming a trench in a silicon layer, forming a first dielectric on the exposed surface of the trench, performing an anisotropic etch of the first dielectric to expose silicon at the bottom of the trench, implanting a dopant into exposed silicon at the bottom of the trench, forming a first polysilicon layer over the first dielectric, forming a second dielectric over the first polysilicon layer, and forming a second polysilicon layer over the second dielectric to fill the trench.