The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2020

Filed:

Aug. 10, 2018
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Robert M. Danen, Pleasanton, CA (US);

Dmitri G. Starodub, Santa Clara, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/66 (2006.01); G01N 21/88 (2006.01); G01N 21/95 (2006.01); G02B 27/00 (2006.01); G06F 17/50 (2006.01); H01L 27/11556 (2017.01); H01L 27/11582 (2017.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67288 (2013.01); G01N 21/8806 (2013.01); G01N 21/95 (2013.01); G02B 27/0012 (2013.01); G06F 17/5018 (2013.01); H01L 22/12 (2013.01); G01N 2201/0675 (2013.01); G06F 2217/16 (2013.01); H01L 21/02532 (2013.01); H01L 21/02636 (2013.01); H01L 27/11556 (2013.01); H01L 27/11582 (2013.01);
Abstract

Disclosed are methods and apparatus for facilitating defect detection in a multilayer stack. The method includes selection of a set of structure parameters for modeling a particular multilayer stack and a particular defect contained within such particular multilayer stack and a set of operating parameters for an optical inspection system. Based on the set of structure and operating parameters, an electromagnetic simulation is performed of waves scattered from the particular multilayer stack and defect and arriving at a collection pupil of the optical inspection system. Based on the simulated waves at the collection pupil, a design of a phase filter having a plurality of positions for changing a plurality of phases within a plurality of corresponding positions of the collection pupil of the optical inspection tool is determined so as to compensate for an adverse effect of the particular multilayer stack on obtaining a defect signal for the defect within such particular multilayer stack and/or to enhance such defect signal. The design of the phase filter is then provided for fabrication or configuration of a phase filter inserted within the optical inspection system for detection of defects in multilayer stacks with the same structure parameters as the particular multilayer stack. Methods and systems for inspecting a multilayer stack for defects are also disclosed.


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