The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2020
Filed:
May. 08, 2018
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Assignee:
FEI Company, Hillsboro, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/26 (2006.01); H01J 37/28 (2006.01); G06T 5/50 (2006.01); G06T 7/11 (2017.01);
U.S. Cl.
CPC ...
H01J 37/261 (2013.01); G06T 5/50 (2013.01); G06T 7/11 (2017.01); G06T 2207/10061 (2013.01); G06T 2207/20224 (2013.01); H01J 2237/24507 (2013.01); H01J 2237/2806 (2013.01);
Abstract
Charging areas in electron microscopy are identified by comparing images obtained in different frames. A difference image or one or more optical flow parameters can be used for the comparison. If charging is detected, electron dose is adjusted, typically just in specimen areas associated with charging. Dose is conveniently adjusted by adjusting electron beam dwell time. Upon adjustment, a final image is obtained, with charging effects eliminated or reduced.