The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2020

Filed:

Aug. 23, 2017
Applicant:

Win Semiconductors Corp., Tao Yuan, TW;

Inventors:

Chia-Ta Chang, Tao Yuan, TW;

Chun-Ju Wei, Tao Yuan, TW;

Kuo-Lung Weng, Tao Yuan, TW;

Assignee:

WIN SEMICONDUCTORS CORP., Tao Yuan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03H 3/02 (2006.01); H03H 9/02 (2006.01); H03H 9/17 (2006.01); H03H 9/13 (2006.01); H03H 9/58 (2006.01); H03H 3/04 (2006.01); H03H 9/56 (2006.01); H03H 9/60 (2006.01);
U.S. Cl.
CPC ...
H03H 3/02 (2013.01); H03H 3/04 (2013.01); H03H 9/02007 (2013.01); H03H 9/02118 (2013.01); H03H 9/132 (2013.01); H03H 9/173 (2013.01); H03H 9/587 (2013.01); H03H 9/56 (2013.01); H03H 9/605 (2013.01); H03H 2003/021 (2013.01); H03H 2003/0442 (2013.01); H03H 2009/02165 (2013.01);
Abstract

A method for fabricating bulk acoustic wave resonator with mass adjustment structure, comprising following steps of: forming a sacrificial structure mesa on a substrate; etching the sacrificial structure mesa such that any two adjacent parts have different heights, a top surface of a highest part of the sacrificial structure mesa is coincident with a mesa top extending plane; forming an insulating layer on the sacrificial structure mesa and the substrate; polishing the insulating layer to form a polished surface; forming a bulk acoustic wave resonance structure including a top electrode, a piezoelectric layer and a bottom electrode on the polished surface; etching the sacrificial structure mesa to form a cavity; the insulating layer between the polished surface and the mesa top extending plane forms a frequency tuning structure, the insulating layer between the mesa top extending plane and the cavity forms a mass adjustment structure.


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