The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2020
Filed:
Nov. 16, 2018
Applicant:
Advanced Energy Industries, Inc., Fort Collins, CO (US);
Inventors:
Kevin Fairbairn, Los Gatos, CA (US);
Denis Shaw, Fort Collins, CO (US);
Daniel Carter, Fort Colins, CO (US);
Assignee:
Advanced Energy Industries, Inc., Fort Collins, CO (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/48 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32146 (2013.01); C23C 14/48 (2013.01); H01J 37/3299 (2013.01); H01J 37/32174 (2013.01); H01J 37/32935 (2013.01);
Abstract
Systems and methods for plasma processing are disclosed. A method includes applying power to a plasma processing chamber during a first processing step and generating, during the first processing step, a first plasma sheath voltage between a substrate and a plasma. During a second processing step (that follows the first processing step), power is applied to the plasma processing chamber and a different plasma sheath voltage is applied between the substrate and the plasma.