The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2020

Filed:

Feb. 28, 2019
Applicant:

Fei Company, Hillsboro, OR (US);

Inventors:

Ali Mohammadi-Gheidari, Best, NL;

Ivan Lazić, Eindhoven, NL;

Eric Bosch, Eindhoven, NL;

Gerard van Veen, Waalre, NL;

Assignee:

FEI Company, Hillsboro, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); H01J 37/28 (2006.01); H01J 37/244 (2006.01); H01J 37/09 (2006.01); H01J 37/147 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/09 (2013.01); H01J 37/1474 (2013.01); H01J 37/244 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/24578 (2013.01);
Abstract

Techniques for multi-beam scanning transmission charged particle microscopy are disclosed herein. An example apparatus at least includes a charged particle beam column to produce a plurality of charged particle beams and irradiate a specimen with each of the plurality of charged particle beams, and an imaging system to collect charged particles of each of the charged particle beams of the plurality of charged particle beams that traverse the specimen during said irradiation, and to direct each charged particle beam of the plurality of the charged particle beams after traversing the sample onto a detector, where each charged particle beam includes a barycenter, and where the detector is disposed in an intermediate location between a back focal plane and an imaging plane of the imaging system.


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