The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2020
Filed:
Dec. 08, 2017
Kla-tencor Corporation, Milpitas, CA (US);
Hidong Kwak, San Jose, CA (US);
John Lesoine, San Jose, CA (US);
Malik Sadiq, Walnut Creek, CA (US);
Lanhua Wei, Fremont, CA (US);
Shankar Krishnan, Santa Clara, CA (US);
Leonid Poslavsky, Belmont, CA (US);
Mikhail M. Sushchik, Pleasanton, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.