logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10598617 B1

PDFFull Text
Date of Patent:
Mar. 24, 2020

Filed:

Aug. 08, 2017

Metrology guided inspection sample shaping of optical inspection results

Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Kaushik Sah, Kessel-Lo, BE;

Andrew James Cross, Cheshire, GB;

Antonio Mani, Leuven, BE;

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:

Hodgson Russ LLP

Primary Examiner:

Hadi Akhavannik

Int. Cl.
CPC ...
G06K 9/00 (2006.01); G01N 23/2251 (2018.01); H01L 21/66 (2006.01); G01N 21/956 (2006.01); G01N 21/88 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01N 23/2251 (2013.01); H01L 22/20 (2013.01); G01N 21/9501 (2013.01); G01N 21/95607 (2013.01); G01N 2021/8867 (2013.01); H01L 22/12 (2013.01);
Abstract

Information from metrology tools can be used during inspection or review with a scanning electron microscope. Metrology measurements of a wafer are interpolated and/or extrapolated over a field, which creates modified metrology data. The modified metrology data is associated with defect attributes from inspection measurements of a wafer. A wafer review sampling plan is generated based on the defect attributes and the modified metrology data. The wafer review sampling plan can be used during review of a wafer using the scanning electron microscope.

Find Patent Forward Citations

Sah, Kaushik. (2020). Metrology guided inspection sample shaping of optical inspection results (U.S. Patent No. 10598617). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10598617

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…