The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2020
Filed:
Mar. 14, 2016
Asml Netherlands B.v., Veldhoven, NL;
Simon Gijsbert Josephus Mathijssen, Rosmalen, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Alessandro Polo, Delft, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Adrianus Johannes Hendrikus Schellekens, Liempde, NL;
Elahe Yeganegi Dastgerdi, Eindhoven, NL;
Willem Marie Julia Marcel Coene, Geldrop, NL;
Erik Willem Bogaart, Someren, NL;
Simon Reinald Huisman, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.