The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2020

Filed:

Jul. 17, 2017
Applicants:

Asml Holding N.v., Veldhoven, NL;

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Ronald Peter Albright, Norwalk, CT (US);

Lowell Lane Baker, Norwalk, CT (US);

Daniel Nathan Burbank, Ridgefield, CT (US);

Assignees:

ASML Holding N.V., Veldhoven, NL;

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 1/24 (2012.01); G03F 1/64 (2012.01);
U.S. Cl.
CPC ...
G03F 7/70916 (2013.01); G03F 1/24 (2013.01); G03F 1/64 (2013.01); G03F 7/707 (2013.01); G03F 7/708 (2013.01); G03F 7/70033 (2013.01); G03F 7/7095 (2013.01); G03F 7/70716 (2013.01); G03F 7/70808 (2013.01); G03F 7/70908 (2013.01); G03F 7/70983 (2013.01);
Abstract

Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and a movable part of the lithography apparatus. The particle trap may also be a surface geometric particle trap located on a surface of a particle sensitive environment in lithography or metrology apparatus.


Find Patent Forward Citations

Loading…