The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2020
Filed:
Mar. 09, 2017
Mitsui Chemicals, Inc., Tokyo, JP;
Kazuo Kohmura, Chiba, JP;
Daiki Taneichi, Otake, JP;
Takashi Kozeki, Otake, JP;
Yosuke Ono, Sodegaura, JP;
Hisako Ishikawa, Ichihara, JP;
Tsuneaki Biyajima, Otake, JP;
Atsushi Okubo, Tokyo, JP;
Yasuyuki Sato, Ibara, JP;
Toshiaki Hirota, Ibara, JP;
MITSUI CHEMICALS, INC., Minato-Ku, Tokyo, JP;
Abstract
Provided are a pellicle for extreme ultraviolet light lithography, a method for producing the same, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame supporting the first frame; a through-hole running through the first frame; and a filter covering the through-hole on the side of a surface of the first frame on which the pellicle film is located. The through-hole may run through the pellicle film; and the filter may be located on the pellicle film. The filter may be located, adjacent to the pellicle film, on the first frame.