The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2020

Filed:

Jan. 29, 2019
Applicant:

United Semiconductor (Xiamen) Co., Ltd., Xiamen, Fujian, CN;

Inventors:

Sheng-Hsu Liu, Changhua County, TW;

Shih-Hsien Huang, Kaohsiung, TW;

Wen Yi Tan, Fujian, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/76 (2006.01); H01L 29/78 (2006.01); H01L 29/16 (2006.01); H01L 29/165 (2006.01); H01L 21/306 (2006.01); H01L 21/02 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/78 (2013.01); H01L 21/02529 (2013.01); H01L 21/02532 (2013.01); H01L 21/306 (2013.01); H01L 29/165 (2013.01); H01L 29/1608 (2013.01); H01L 29/6656 (2013.01);
Abstract

A transistor structure includes a substrate. A gate structure is disposed on the substrate. A hexagonal-shaped trench is disposed in the substrate at one side of the gate structure. A first epitaxial layer including first-type dopants is disposed in the hexagonal-shaped trench and contacts the hexagonal-shaped trench. A second epitaxial layer including second-type dopants is disposed in the hexagon-shaped trench. The first epitaxial layer is outside of the second epitaxial layer. The second epitaxial layer serves as a source/drain doped region of the transistor structure. The first-type dopants and the second-type dopants are of different conductive types.


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