The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2020
Filed:
Jul. 13, 2017
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Helen Liu, Fremont, CA (US);
Andrew Zeng, Fremont, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/06 (2006.01); G01B 11/24 (2006.01); G01N 21/84 (2006.01); G01N 21/956 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01B 11/0675 (2013.01); G01B 11/2441 (2013.01); G01N 21/8422 (2013.01); G01N 21/9501 (2013.01); G01N 21/956 (2013.01);
Abstract
A system includes one or more wafer geometry measurement tools configured to obtain geometry measurements from a wafer. The system also includes one or more processors in communication with the one or more wafer geometry measurement tools. The one or more processors are configured to apply a correction model to correct the geometry measurements obtained by the one or more wafer geometry measurement tools. The correction model is configured to correct measurement errors caused by a transparent film positioned on the wafer.