The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2020
Filed:
Feb. 14, 2018
Globalfoundries Singapore Pte. Ltd., Singapore, SG;
Hao Nong, Singapore, SG;
Liang Li, Singapore, SG;
Chiew Wah Yap, Singapore, SG;
Ting Huo, Singapore, SG;
Yung Fu Chong, Singapore, SG;
Yun Ling Tan, Singapore, SG;
GLOBALFOUNDRIES SINGAPORE PTE. LTD., Singapore, SG;
Abstract
Methods of forming integrated circuits are provided herein. In an embodiment, a method of forming an integrated circuit includes providing a semiconductor substrate. The semiconductor substrate includes a plurality of gate structures that have sidewalls spacers disposed adjacent to the gate structures. A gap is defined between sidewall spacers of adjacent gate structures. The method proceeds with decreasing an aspect ratio between a width of the gap at an opening thereto and a depth of the gap, wherein an aspect ratio between a width of the gap at a base of the sidewall spacers and the depth of the gap remains substantially unchanged after decreasing the aspect ratio between the width of the gap at the opening thereto.