The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2020

Filed:

Sep. 21, 2018
Applicant:

Micron Technology, Inc., Boise, ID (US);

Inventor:

Arup Bhattacharyya, Essex Junction, VT (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 11/56 (2006.01); H01L 29/792 (2006.01); H01L 29/51 (2006.01); H01L 29/49 (2006.01); G11C 16/10 (2006.01); G11C 16/14 (2006.01); G11C 16/04 (2006.01);
U.S. Cl.
CPC ...
G11C 11/5671 (2013.01); G11C 16/0466 (2013.01); G11C 16/10 (2013.01); G11C 16/14 (2013.01); H01L 29/4966 (2013.01); H01L 29/513 (2013.01); H01L 29/517 (2013.01); H01L 29/518 (2013.01); H01L 29/7923 (2013.01);
Abstract

Memory cells programmed via multi-mechanism charge transports are described herein. An example apparatus includes a semiconductor material, a tunneling material formed on the semiconductor material, a charge trapping material formed on the tunneling material, a charge blocking material formed on the charge trapping material, and a metal gate formed on the charge blocking material. The charge trapping material comprises gallium nitride (GaN), and the memory cell is programmed to the target state via the multi-mechanism charge transport such that charges are simultaneously transported to the charge trapping material through a plurality of different channels.


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