The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2020

Filed:

Nov. 16, 2017
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Li-Chun Tien, Tainan, TW;

Ya-Chi Chou, Hsinchu, TW;

Hui-Zhong Zhuang, Kaohisung, TW;

Chun-Fu Chen, Chiayi, TW;

Ting-Wei Chiang, New Taipei, TW;

Hsiang Jen Tseng, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/02 (2006.01); H01L 27/118 (2006.01); G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0207 (2013.01); G06F 17/5068 (2013.01); H01L 27/11807 (2013.01); H01L 2027/11875 (2013.01);
Abstract

A semiconductor device includes an array of Engineering Change Order (ECO) cells. Each of the ECO cells in the array includes a first metal pattern and a second metal pattern. Each of the ECO cells in the array further includes a plurality of active area patterns isolated from each other and arranged between the first and second metal patterns. Each of the ECO cells in the array further includes a first central metal pattern overlapping the first metal pattern. Each of the ECO cells in the array further includes a via electrically connecting the first central metal pattern to the first metal pattern. The plurality of active area patterns is arranged symmetrically about the first central metal pattern.


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