The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2020

Filed:

Aug. 21, 2017
Applicant:

Flir Systems, Inc., Wilsonville, OR (US);

Inventors:

Paul Schweikert, Ventura, CA (US);

Andrew Sharpe, Solvang, CA (US);

Gregory A. Carlson, Goleta, CA (US);

Alex Matson, Goleta, CA (US);

Scott Vilander, Santa Barbara, CA (US);

Bob Zahuta, Santa Barbara, CA (US);

Richard M. Goeden, Goleta, CA (US);

Assignee:

FLIR Systems, Inc., Wilsonville, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/677 (2006.01); H01L 21/68 (2006.01); H01L 21/683 (2006.01); H01L 21/50 (2006.01); H01L 31/09 (2006.01); H01L 31/0203 (2014.01); B81C 1/00 (2006.01); H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/50 (2013.01); B81C 1/00269 (2013.01); H01L 21/6719 (2013.01); H01L 21/67109 (2013.01); H01L 21/67207 (2013.01); H01L 21/67745 (2013.01); H01L 21/67748 (2013.01); H01L 21/67757 (2013.01); H01L 21/681 (2013.01); H01L 21/6831 (2013.01); H01L 31/0203 (2013.01); H01L 31/09 (2013.01); B81C 2203/0118 (2013.01); H01L 24/94 (2013.01); H01L 2924/12042 (2013.01); H01L 2924/1461 (2013.01); H01L 2924/16235 (2013.01);
Abstract

An apparatus for the wafer level packaging (WLP) of micro-bolometer vacuum package assemblies (VPAs), in one embodiment, includes a wafer alignment and bonding chamber, a bolometer wafer chuck and a lid wafer chuck disposed within the chamber in vertically facing opposition to each other, means for creating a first ultra-high vacuum (UHV) environment within the chamber, means for heating and cooling the bolometer wafer chuck and the lid wafer chuck independently of each other, means for moving the lid wafer chuck in the vertical direction and relative to the bolometer wafer chuck, means for moving the bolometer wafer chuck translationally in two orthogonal directions in a horizontal plane and rotationally about a vertical axis normal to the horizontal plane, and means for aligning a fiducial on a bolometer wafer held by the bolometer wafer chuck with a fiducial on a lid wafer held by the lid wafer chuck.


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