The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2020
Filed:
May. 10, 2018
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Hiraku Murakami, Miyagi, JP;
Masaru Isago, Miyagi, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 7/00 (2006.01); H01J 37/32 (2006.01); B08B 9/027 (2006.01); B08B 5/02 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32862 (2013.01); B08B 5/02 (2013.01); B08B 9/027 (2013.01); H01J 37/32871 (2013.01); B08B 2209/032 (2013.01); H01L 21/67069 (2013.01);
Abstract
There is provision of a cleaning method of a plasma processing apparatus including a plasma treatment chamber for applying plasma treatment to a substrate. The method includes: insulating a part of the plasma treatment chamber, generating plasma of fluorocarbon gas in the plasma treatment chamber, and removing deposits on a non-plasma surface of a space outside of the plasma treatment chamber, by the plasma of the fluorocarbon gas introduced from the plasma treatment chamber to the outside space.