The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2020
Filed:
Dec. 07, 2015
Asml Netherlands B.v., Veldhoven, NL;
Cornelius Maria Rops, Waalre, NL;
Walter Theodorus Matheus Stals, Veldhoven, NL;
David Bessems, Eindhoven, NL;
Giovanni Luca Gattobigio, Eindhoven, NL;
Victor Manuel Blanco Carballo, Veldhoven, NL;
Erik Henricus Egidius Catharina Eummelen, Eindhoven, NL;
Ronald Van Der Ham, Maarheeze, NL;
Frederik Antonius Van Der Zanden, Veldhoven, NL;
Wilhelmus Antonius Wernaart, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure COgas so as to provide a substantially pure COgas environment adjacent to, and radially outward of, the space.