The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2020
Filed:
Mar. 26, 2013
Applicant:
Hitachi Chemical Company, Ltd., Tokyo, JP;
Inventors:
Tomohiro Iwano, Hitachi, JP;
Hisataka Minami, Hitachi, JP;
Toshiaki Akutsu, Hitachi, JP;
Koji Fujisaki, Kokubunji, JP;
Assignee:
HITACHI CHEMCIAL COMPANY, LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C09K 3/14 (2006.01); C09G 1/02 (2006.01); B24B 37/04 (2012.01); C01B 33/12 (2006.01); H01L 21/304 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
B24B 37/044 (2013.01); C01B 33/12 (2013.01); C09G 1/02 (2013.01); H01L 21/304 (2013.01);
Abstract
A polishing liquid comprising an abrasive grain, an additive, and water, wherein the abrasive grain includes a hydroxide of a tetravalent metal element, and produces absorbance of 1.00 or more and less than 1.50 for light having a wavelength of 400 nm in an aqueous dispersion having a content of the abrasive grain adjusted to 1.0 mass %.