The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2020
Filed:
Mar. 06, 2018
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Hitoshi Hashima, Koshi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05B 12/08 (2006.01); B05B 12/02 (2006.01); H01L 21/67 (2006.01); B05B 12/00 (2018.01); G01N 27/00 (2006.01);
U.S. Cl.
CPC ...
B05B 12/081 (2013.01); B05B 12/004 (2013.01); B05B 12/02 (2013.01); G01N 27/002 (2013.01); H01L 21/6708 (2013.01); H01L 21/6715 (2013.01); H01L 21/67051 (2013.01); H01L 21/67253 (2013.01);
Abstract
An operating method of a processing liquid supply apparatus which supplies a processing liquid to a substrate from a processing liquid supply path via a nozzle includes measuring a surface potential of a first electrode which is configured to be in contact with the processing liquid of the processing liquid supply path. The operating method further includes displaying the measured surface potential in the measuring of the surface potential of the first electrode.