The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2020
Filed:
Jun. 05, 2013
Hitachi High-technologies Corporation, Tokyo, JP;
Satoru Yamaguchi, Tokyo, JP;
Kei Sakai, Tokyo, JP;
Osamu Inoue, Tokyo, JP;
Kazuyuki Hirao, Tokyo, JP;
Osamu Komuro, Tokyo, JP;
HITACHI HIGH-TECHNOLOGIES CORPORATION, Tokyo, JP;
Abstract
The purpose of the present invention is to provide an overlay error measuring device which measures an overlay error with high accuracy even when a lower layer pattern is disposed under a thin film and a sufficient signal amount cannot be ensured. The present invention proposes an overlay error measuring device provided with an arithmetic processing unit for measuring a pattern formed on a sample on the basis of a signal waveform obtained by a charged particle beam device. The arithmetic processing unit finds a correlation with the signal waveform using a partial waveform obtained on the basis of partial extraction of the signal waveform, forms a correlation profile indicating the correlation, and measures an overlay error using the correlation profile.