The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2020

Filed:

Sep. 28, 2018
Applicant:

Nuflare Technology, Inc., Yokohama-shi, JP;

Inventors:

Makoto Yabe, Yokohama, JP;

Hiroteru Akiyama, Yokohama, JP;

Takafumi Inoue, Chigasaki, JP;

Assignee:

NUFLARE TECHNOLOGY, INC., Yokohama-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G06K 9/32 (2006.01); G06T 7/00 (2017.01); G03F 1/42 (2012.01); G03F 1/84 (2012.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G06K 9/3216 (2013.01); G03F 1/42 (2013.01); G03F 1/84 (2013.01); G03F 9/7007 (2013.01); G06T 7/0004 (2013.01); G06T 2207/30108 (2013.01);
Abstract

An inspection method includes a rough alignment process of acquiring optical images of first and second patterns previously set to confirm whether a position misalignment amount in a rotation direction of a sample with respect to an X or Y direction is equal to or smaller than a first acceptable value, and conforming whether the position misalignment amount is equal to or smaller than the first acceptable value on the basis of an acquisition result, and a fine alignment process of acquiring optical images of third patterns positioned on different corners of a rectangular frame constituted of four sides along the X or Y direction on an optical image of the sample and rotating a stage until a position misalignment amount detected based on the optical images of the third patterns becomes equal to or smaller than a second acceptable value being smaller than the first acceptable value.


Find Patent Forward Citations

Loading…