The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2020

Filed:

Jul. 03, 2018
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Makoto Hayakawa, Koshi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/687 (2006.01); G03F 7/16 (2006.01); G03F 7/09 (2006.01); G06T 7/00 (2017.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67265 (2013.01); G03F 7/091 (2013.01); G03F 7/162 (2013.01); G03F 7/3028 (2013.01); G06T 7/0004 (2013.01); H01L 21/67288 (2013.01); H01L 21/68764 (2013.01); G06T 2207/30148 (2013.01);
Abstract

The method includes a step of executing a rotation treatment in a rotation treatment apparatus; a step of imaging a substrate on which the rotation treatment has been executed, in an inspection apparatus; a step of acquiring change amount information stored in advance, being information on an amount of change in orientation of the substrate while the substrate is moved from the rotation treatment apparatus to the inspection apparatus; a step of acquiring, as an execution result information, information on an execution result of the rotation treatment along a circumferential direction of the substrate, based on an imaging result in the inspection apparatus; and a step of correcting a position of the substrate at a time of the rotation treatment, based on the change amount information and the execution result information.


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