The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2019

Filed:

Feb. 26, 2015
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd, Hsin-Chu, TW;

Inventors:

Chien-Chun Hu, Taichung, TW;

Chen-Liang Chang, New Taipei, TW;

Ju-Ru Hsieh, Taipei, TW;

Po-Chia Chen, Taichung, TW;

Shun-Yu Chuang, Taichung, TW;

Wei-Tuzo Lin, Taichung, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/12 (2006.01); B08B 3/10 (2006.01); B08B 1/04 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67046 (2013.01); B08B 1/04 (2013.01); B08B 3/102 (2013.01); B08B 3/12 (2013.01); H01L 21/67051 (2013.01);
Abstract

A method of cleaning a wafer in semiconductor fabrication is provided. The method includes cleaning a wafer using a wafer scrubber. The method further includes moving the wafer scrubber into an agitated cleaning fluid. The method also includes creating a contact between the wafer scrubber and a cleaning stage in the agitated cleaning fluid. In addition, the method includes cleaning the wafer or a second wafer by the wafer scrubber after the wafer scrubber is cleaned by the agitated cleaning fluid.


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