The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 2019

Filed:

Nov. 06, 2015
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Kwangduk Douglas Lee, Redwood City, CA (US);

Sudha Rathi, San Jose, CA (US);

Ramprakash Sankarakrishnan, Santa Clara, CA (US);

Martin Jay Seamons, San Jose, CA (US);

Irfan Jamil, San Jose, CA (US);

Bok Hoen Kim, San Jose, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01J 37/32 (2006.01); G03F 7/42 (2006.01); H01L 21/311 (2006.01); B08B 7/00 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32853 (2013.01); B08B 7/0035 (2013.01); G03F 7/427 (2013.01); H01L 21/02041 (2013.01); H01L 21/31116 (2013.01);
Abstract

Embodiments of the invention generally relate to methods of dry stripping boron-carbon films. In one embodiment, alternating plasmas of hydrogen and oxygen are used to remove a boron-carbon film. In another embodiment, co-flowed oxygen and hydrogen plasma is used to remove a boron-carbon containing film. A nitrous oxide plasma may be used in addition to or as an alternative to either of the above oxygen plasmas. In another embodiment, a plasma generated from water vapor is used to remove a boron-carbon film. The boron-carbon removal processes may also include an optional polymer removal process prior to removal of the boron-carbon films. The polymer removal process includes exposing the boron-carbon film to NFto remove from the surface of the boron-carbon film any carbon-based polymers generated during a substrate etching process.


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